Air Purifier TECHNOLOGY
Plasmacluster Technology
Winner of the Invention Prize at the 2008 National Invention Awards Ceremony held by the Japan Institute of Invention and Innovation (JIII)
Patented by Sharp (patent No. 3680121)
The plasma device generates and emits the same positive and negative ions that occur in nature. Plasmacluster technology is Sharp's original air purifying technology that removes suspended airborne mold and viruses.
Winner of the Invention Prize at the 2008 National Invention Awards Ceremony held by the Japan Institute of Invention and Innovation (JIII)Patented by Sharp (patent No. 3680121)
Refined Antibacterial Air-Sanitizing Technology
Plasmacluster technology is an original Sharp sanitizing technology that purifies the air by emitting highly safe positive and negative ions of the same type found in nature. It sanitizes and purfies suspended airborne mold, viruses and allergens.
- Removal of Dust Mite Allergens
- Removal of Mold
- Removal of Viruses
- Removal of Odor
- Reducing Growth of Adhering Mold
- Increase in Adhering Odor Removal Speed (1.5 times faster)
Powerful Humidifying Effects
Humidifying improves the effectiveness and endurance of Plasmacluster Ions
Humidifying prevents dust and pollen from circulating and clinging to clothing or other fibers
Rotating humidifying Filter with Humidity Detector
Prevents mold growth in the wet season
Powerful removal of stubborn lingering odors
Spot deodorizing function